'Foundry' Category Archive

Rubicon Produces 8" Sapphire Wafers for Peregrine UltraCMOS SOS RFICs

Posted by EDA Geek News Staff in Foundry, Wireless on Monday, July 28, 2008

Peregrine Semiconductor Corporation, a leading supplier of high-performance RF CMOS and mixed-signal communications ICs and Rubicon Technology, a leading manufacturer of sapphire substrates and other advanced technology materials, announced that Rubicon has begun initial production of 8" sapphire wafers for supply to Peregrine for its UltraCMOS[tm] Silicon-on-Sapphire (SOS) semiconductor processing.

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UMC Decides to Join SEMATECH

Posted by EDA Geek News Staff in Foundry on Monday, July 28, 2008

SEMATECH, the international consortium of semiconductor manufacturers that conducts and sponsors cooperative research and development of advanced semiconductor technology, and UMC, (NYSE: UMC, TSE: 2303) a leading global semiconductor foundry, announced UMC's decision to join SEMATECH. The relationship will focus on research and development for exploratory technologies on 300mm wafers, including 22nm and beyond process generations.

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SVTC Technologies, Infineon, Maxim, Anadigics Join Fab Owners Association

Posted by EDA Geek News Staff in Foundry on Monday, July 14, 2008

The Fab Owners Association (FOA), the association of semiconductor / MEMS manufacturing executives and suppliers, has announced the addition of it newest device-maker members: SVTC Technologies, Infineon, Maxim, Anadigics.

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Sarnoff Debuts Ultra-Sense Back-Thinning for Image Sensor Fabrication

Posted by EDA Geek News Staff in Foundry on Tuesday, July 8, 2008

Sarnoff Corporation introduced Ultra-Sense[tm], a complete wafer processing solution that reduces the manufacturing costs of high-performance back-illuminated image sensors. Ultra-Sense is an innovative solution that combines patented Silicon-on-Insulator (SOI) wafer technology with low-cost, scalable fabrication techniques to provide manufacturable back-illuminated image sensors. Sensor designers and manufacturers can use this novel approach to achieve higher resolution, smaller pixel size, higher quantum efficiency (QE) and maximized system performance without incurring additional costs.

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Cypress, Tower Announce .18-Micron Stitched CMOS Image Sensor Device

Posted by EDA Geek News Staff in Foundry on Monday, July 7, 2008

Cypress Semiconductor Corp. (NYSE:CY), a leading developer and manufacturer of programmable mixed-signal solutions and CMOS Image Sensor (CIS) components, and Tower Semiconductor, Ltd. (Nasdaq:TSEM) (TASE:TSEM), an independent specialty foundry, announced the successful completion of Cypress's first 0.18-micron stitched large-format CIS device. The product is to be manufactured using Tower Semiconductor's latest generation of stitching technology at Tower's 200-mm Fab 2 in Migdal Ha'emek, Israel.

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AWR, UMS Unveil Process Design Kit for GaAs pHEMT Foundry Process

Posted by EDA Geek News Staff in Foundry on Monday, June 30, 2008

AWR® and United Monolithic Semiconductors (UMS) introduced an advanced process design kit (PDK) for the UMS PPH25X GaAs pseudomorphic high electron mobility transistor (pHEMT) foundry process. The UMS PPH25X process is dedicated to the design of microwave monolithic integrated circuits (MMIC) at frequencies up to 35 GHz. The PDK lets users take advantage of the industry-leading fabrication capabilities of UMS together with AWR's innovative Microwave Office® design suite.

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